Paper Title:
Low Temperature ECR-PECVD Microcrystalline SiC Growth by Pulsed Gas Flows
  Abstract

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Periodical
Materials Science Forum (Volumes 457-460)
Edited by
Roland Madar, Jean Camassel and Elisabeth Blanquet
Pages
309-312
DOI
10.4028/www.scientific.net/MSF.457-460.309
Citation
M.J. Hernández, M. Cervera, J. Piqueras, T. del Caño, J. Jiménez, "Low Temperature ECR-PECVD Microcrystalline SiC Growth by Pulsed Gas Flows", Materials Science Forum, Vols. 457-460, pp. 309-312, 2004
Online since
June 2004
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