Paper Title:
Low Temperature (320°C) Deposition of Hydrogenated Microcrystalline Cubic Silicon Carbide Thin Films
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Periodical
Materials Science Forum (Volumes 457-460)
Edited by
Roland Madar, Jean Camassel and Elisabeth Blanquet
Pages
317-320
DOI
10.4028/www.scientific.net/MSF.457-460.317
Citation
S. Miyajima, A. Yamada, M. Konagai, "Low Temperature (320°C) Deposition of Hydrogenated Microcrystalline Cubic Silicon Carbide Thin Films", Materials Science Forum, Vols. 457-460, pp. 317-320, 2004
Online since
June 2004
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