Paper Title:
Etching of SiC with Fluorine ECR Plasma
  Abstract

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Periodical
Materials Science Forum (Volumes 457-460)
Edited by
Roland Madar, Jean Camassel and Elisabeth Blanquet
Pages
821-824
DOI
10.4028/www.scientific.net/MSF.457-460.821
Citation
C. Förster, V. Cimalla, R. Kosiba, G. Ecke, P. Weih, O. Ambacher, J. Pezoldt, "Etching of SiC with Fluorine ECR Plasma", Materials Science Forum, Vols. 457-460, pp. 821-824, 2004
Online since
June 2004
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