Paper Title:
In-Situ Investigation of Carbon Reduction at Ni/4H-SiC Interface Using a Silicon Interlayer
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Periodical
Materials Science Forum (Volumes 457-460)
Edited by
Roland Madar, Jean Camassel and Elisabeth Blanquet
Pages
849-852
DOI
10.4028/www.scientific.net/MSF.457-460.849
Citation
W.Y. Lee, K.S. Teng, S.P. Wilks, "In-Situ Investigation of Carbon Reduction at Ni/4H-SiC Interface Using a Silicon Interlayer", Materials Science Forum, Vols. 457-460, pp. 849-852, 2004
Online since
June 2004
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