Paper Title:
Growth of Bulk SiC by Halide Chemical Vapor Deposition
  Abstract

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Periodical
Materials Science Forum (Volumes 457-460)
Edited by
Roland Madar, Jean Camassel and Elisabeth Blanquet
Pages
87-90
DOI
10.4028/www.scientific.net/MSF.457-460.87
Citation
M. Fanton, M. Skowronski, D. Snyder, H. J. Chung , S. Nigam, B. Weiland, S. W. Huh, "Growth of Bulk SiC by Halide Chemical Vapor Deposition", Materials Science Forum, Vols. 457-460, pp. 87-90, 2004
Online since
June 2004
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