Paper Title:
High Temperature Al/Si Diffusion Coatings Deposited by Chemical Vapor Deposition in Fluidized Bed Reactors (CVD-FBR)
  Abstract

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Periodical
Materials Science Forum (Volumes 461-464)
Edited by
Pierre Steinmetz, Ian G. Wright, Gerry Meier, Alain Galerie, Bernard Pieraggi and Renaud Podor
Pages
313-320
DOI
10.4028/www.scientific.net/MSF.461-464.313
Citation
F.J. Pérez, J.A. Trilleros, M.P. Hierro, A. Milewska, M.C. Carpintero, F.J. Bolívar, "High Temperature Al/Si Diffusion Coatings Deposited by Chemical Vapor Deposition in Fluidized Bed Reactors (CVD-FBR)", Materials Science Forum, Vols. 461-464, pp. 313-320, 2004
Online since
August 2004
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