Paper Title:
Influence of Deposition Processing Conditions on Polycrystalline Silicon Thin Film for Solar Cells on Ceramic Substrates
  Abstract

Various polycrystalline silicon thin films were deposited on Al2O3 ceramic substrates by RTCVD processing under different deposition conditions. The influence of deposition conditions on thin film quality was studied and a set of typical processing parameters were obtained, which would direct the RTCVD processing of thin film silicon solar cell technique.

  Info
Periodical
Materials Science Forum (Volumes 475-479)
Main Theme
Edited by
Z.Y. Zhong, H. Saka, T.H. Kim, E.A. Holm, Y.F. Han and X.S. Xie
Pages
1231-1234
DOI
10.4028/www.scientific.net/MSF.475-479.1231
Citation
H. F. Li, Y. Huang, Z. J. Wan, H. X. Zhang, Y. Xu, "Influence of Deposition Processing Conditions on Polycrystalline Silicon Thin Film for Solar Cells on Ceramic Substrates", Materials Science Forum, Vols. 475-479, pp. 1231-1234, 2005
Online since
January 2005
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