Paper Title:
Chemical Solution Deposition Process and Characterization of Li and Ti Doped NiO Thin Films
  Abstract

Lithium and titanium co-doped NiO ceramics have been found to exhibit a giant low-frequency dielectric constant (ε~105), however, the same system thin films is not yet study. In the present study, Lithium and titanium co-doped NiO thin films were prepared by a chemical solution deposition method using 2-methoxyethanol as a solvent, nickel actate tetrahydrate, lithium acetate dihydrate and titanium isopropoxide as starting materials. The complex oxides such as NiO, Ni0.2O0.8 and NiTiO3 were formed for the Ni0.98Ti0.02O and Ni0.686Li0.294Ti0.02O thin films, and the addition of the lithium lead to the formation of Li2NiO2.888. The dielectric constant of Lithium and titanium co-doped Ni0.686Li0.294Ti0.02O thin films is about 426 at 100 Hz and much higher than that of the titanium-doped Ni0.98Ti0.02O.

  Info
Periodical
Materials Science Forum (Volumes 475-479)
Main Theme
Edited by
Z.Y. Zhong, H. Saka, T.H. Kim, E.A. Holm, Y.F. Han and X.S. Xie
Pages
1595-1598
DOI
10.4028/www.scientific.net/MSF.475-479.1595
Citation
B. P. Zhang, J. F. Li, L. M. Zhang, J. Zeng, Y. Dong, "Chemical Solution Deposition Process and Characterization of Li and Ti Doped NiO Thin Films", Materials Science Forum, Vols. 475-479, pp. 1595-1598, 2005
Online since
January 2005
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$32.00
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