Paper Title:
Effect of Heat Treatment on TiNx Film Structure
  Abstract

TiN films with different nitrogen contents were deposited on glass and Si (100) substrates by d. c. magnetron reactive sputtering. The structure of the films was determined by Xray diffraction. It was found that heat treatment at 773 decreased the lattice parameter. A considerable thermal instability of over-stoichiometric films was observed after annealing films in air. This instability enhanced with increasing nitrogen content and is characterized by an abundant appearance of clear and dark disks in Scanning Electron Microscopy (SEM). Also, it was shown that the film instability does not come from an interfacial reaction but was observed when the TiNx layers present a (200) preferred orientation together with high nitrogen content.

  Info
Periodical
Materials Science Forum (Volumes 480-481)
Edited by
A. Méndez-Vilas
Pages
187-192
DOI
10.4028/www.scientific.net/MSF.480-481.187
Citation
S. Zerkout, M. Benkahoul, H. Sahraoui, S. Achour, A. Mosser, "Effect of Heat Treatment on TiNx Film Structure ", Materials Science Forum, Vols. 480-481, pp. 187-192, 2005
Online since
March 2005
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Price
$32.00
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