Paper Title:
Comparisons on Doping of Different Alkyl Compound on SiO2 to Form a Low-k Dielectric Material
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 480-481)
Edited by
A. Méndez-Vilas
Pages
213-216
DOI
10.4028/www.scientific.net/MSF.480-481.213
Citation
A.Y.K. Lim, K. Ibrahim, "Comparisons on Doping of Different Alkyl Compound on SiO2 to Form a Low-k Dielectric Material", Materials Science Forum, Vols. 480-481, pp. 213-216, 2005
Online since
March 2005
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.