Paper Title:
SiC Materials and Technologies for Sensors Development
  Abstract

Silicon Carbide has proven its strong interest for power and high frequency devices but it also has superior characteristics for application in the sensors and MEMS fields. The characteristic requirements of the starting material are different from that of power devices since the level of defects is not so critical while the layer stress is important especially in 3C-SiC on Si. The keyprocess for MEMS fabrication is the etching, which is progressing thanks to ICP process improvements. A perfect control of the etching step could allow the obtention of nano-resonators in SiC with fairly superior characteristics to the Si ones. Other electrical sensors for high temperature application such as gas sensors or Hall sensors have been also successfully developed taking profit of the deep etching process improvement and high temperature contact developments.

  Info
Periodical
Materials Science Forum (Volumes 483-485)
Edited by
Roberta Nipoti, Antonella Poggi and Andrea Scorzoni
Pages
1009-1014
DOI
10.4028/www.scientific.net/MSF.483-485.1009
Citation
P. Godignon, "SiC Materials and Technologies for Sensors Development", Materials Science Forum, Vols. 483-485, pp. 1009-1014, 2005
Online since
May 2005
Export
Price
$32.00
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