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Crystalline Quality Evaluation of 6H-SiC Bulk Crystals Grown from Si-Ti-C Ternary Solution

Journal Materials Science Forum (Volumes 483 - 485)
Volume Silicon Carbide and Related Materials 2004
Edited by Roberta Nipoti, Antonella Poggi and Andrea Scorzoni
Pages 13-16
DOI 10.4028/www.scientific.net/MSF.483-485.13
Citation Kazuhiko Kusunoki et al., 2005, Materials Science Forum, 483-485, 13
Online since May, 2005
Authors Kazuhiko Kusunoki, Kazuhito Kamei, Y. Ueda, S. Naga, Y. Ito, Mitsuhiro Hasebe, Toru Ujihara, Kazuo Nakajima
Keywords 6H-SiC, Micropipe Free, Molten KOH Etching, Solution Growth
Abstract

The growth of 6H-SiC crystal from Si-Ti-C ternary solution was conducted under the temperature gradient and the crystalline quality evaluations of the grown crystals were carried out. 6H-SiC(0001) on-axis pvt-grown crystal was used as a seed crystal. Micropipes in the seed crystal were terminated during the solution growth and 28mm􀊷28mm self-standing micropipe-free SiC crystals were obtained. The quality of the grown crystals was investigated by SIMS, high-resolution x-ray diffraction and molten KOH etching. The content of residual impurities in the SiC were very low. The X-ray 􀐢-rocking curves of the solution grown SiC showed single peak with high peak intensity ,while that of the seed crystal showed several peaks due to the misoriented domains. Moreover, it was found that the number of etch-pit in the grown crystal is much less than that in the seed crystal and it decreases with the increase of the growth thickness. These results indicate that the crystalline quality of grown crystal was significantly improved during the solution growth.

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