Paper Title:
Regrowth of 3C-SiC on CMP Treated 3C-SiC/Si Epitaxial Layers
  Abstract

In this work, we have investigated the 3C-SiC re-growth on planarized 3C-SiC epitaxial layers, grown on (001)Si, after the application of a chemical mechanical polishing (CMP) process. A specific polishing process was developed for 3C-SiC to achieve a flat, high-quality surface. The interface between the deposited 3C-SiC and the polished 3C-SiC on Si film was studied by TEM characterization to determine if defects appear at this interface. It was observed that no additional defects were nucleated at the interface. The resulting re-grown film roughness, as a function of film thickness, was studied and is reported along with recommendations for future work.

  Info
Periodical
Materials Science Forum (Volumes 483-485)
Edited by
Roberta Nipoti, Antonella Poggi and Andrea Scorzoni
Pages
197-200
DOI
10.4028/www.scientific.net/MSF.483-485.197
Citation
H. Mank, C. Moisson, D. Turover, M. E. Twigg, S. E. Saddow, "Regrowth of 3C-SiC on CMP Treated 3C-SiC/Si Epitaxial Layers", Materials Science Forum, Vols. 483-485, pp. 197-200, 2005
Online since
May 2005
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: J.R. Grim, Marek Skowronski, W.J. Everson, V.D. Heydemann
Abstract:The selectivity, material removal rate, and the residual subsurface damage of colloidal silica (CS) chemi-mechanical polishing (CMP) of...
1095
Authors: Jun Li, Yong Zhu, Chuang Tian Chen
Abstract:Transparent Nd:YAG ceramics which are very hard and brittle materials, are very difficult to be polished. There are many micro scratches or...
278
Authors: Xiu Fang Chen, Ru Sheng Wei, Yu Qiang Gao, Yan Peng, Sheng Song, Li Huan Wang, Xiao Bo Hu, Xian Gang Xu, Min Hua Jiang
Abstract:Graphene, as strict two-dimensional material, exhibits exceptionally good electronic properties. In this paper, graphene was prepared on SiC...
90
Authors: Ming Sun, Bai Mei Tan, Xin Huan Niu, Juan Wang, Yan Gang He, Yu Ling Liu, Na Wang, Bao Hong Gao
Chapter 2: Transport Processes of Chemical Engineering
Abstract:The effects of the polyamine chelating agent and nonions surfactant additive on the surface defectivity reduction in the final polishing of...
390
Authors: Yang Chen, Wei Bin Mu, Zhao Fang Tang, Ya Juan Zhu, Zhi Gang Chen
Chapter 1: Materials Design
Abstract:CeO2 nanoparticles were synthesized by homogeneous precipitation in mixed solvent of alcohol and deionized water under microwave...
376