Paper Title:
RBS-Channeling and EPR Studies of Damage in 2 MeV Al2+-Implanted 6H-SiC Substrates
  Abstract

6H-SiC single crystalline substrates were implanted at room temperature with 2 MeV Al2+ ions to fluences from 2×1014 Al2+ cm-2 to 7×1014 Al2+ cm-2 and with different current densities (from 6.6 to 33×1010 Al2+ cm-2 s-1). The depth profile of the damage induced by the Al2+ ions was determined by Backscattering Spectrometry in channeling geometry (BS/C) with a 3.5 MeV He2+ beam. The BS/C spectra were evaluated using the RBX code. The samples were subsequently annealed at 1100°C in N2 for one hour, in order to analyze their structural recovery by BS/C and the amount of the remaining defects by means of Electron Paramagnetic Resonance (EPR). The results from the BS/C spectra corresponding to the as-implanted samples indicate that the damage depends strongly on the total fluence but also, although to a lesser extent, on the beam current density. The BS/C measurements reveal that all the samples, except the one implanted with the highest fluence, recover completely their original crystalline structure after the annealing. Furthermore the angular anisotropy of the EPR spectra indicates that the implanted region recovered a good crystallinity, although some residual defects were observed.

  Info
Periodical
Materials Science Forum (Volumes 483-485)
Edited by
Roberta Nipoti, Antonella Poggi and Andrea Scorzoni
Pages
291-294
DOI
10.4028/www.scientific.net/MSF.483-485.291
Citation
Y. Morilla, J. García López, G. Battistig, J.L. Cantin, J. C. Cheang-Wong, H. J. von Bardeleben, M.A. Respaldiza, "RBS-Channeling and EPR Studies of Damage in 2 MeV Al2+-Implanted 6H-SiC Substrates", Materials Science Forum, Vols. 483-485, pp. 291-294, 2005
Online since
May 2005
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