Paper Title:
4H-SiC Lateral RESURF MOSFETs on Carbon-Face Substrates
  Abstract

We have fabricated lateral RESURF MOSFETs on 4H-SiC(0001) Si-face and (000-1) C-face substrates, and compared those properties. The channel mobility of a lateral test MOSFET on a C-face was 41 cm2/Vs, which was much higher than 5 cm2/Vs for that on a Si-face. The specific on-resistance of the lateral RESURF MOSFET on a C-face was improved to 79 mΩcm2 as comparison with 2400 mΩcm2 for Si-face. The breakdown voltage was 490V for Si-face and 460V for C-face, which was 82% and 79% of the designed breakdown voltage of 600V, respectively. The device breakdown occurred destructively at the gate electrode edge.

  Info
Periodical
Materials Science Forum (Volumes 483-485)
Edited by
Roberta Nipoti, Antonella Poggi and Andrea Scorzoni
Pages
805-808
DOI
10.4028/www.scientific.net/MSF.483-485.805
Citation
M. Okamoto, S. Suzuki, M. Kato, T. Yatsuo, K. Fukuda, "4H-SiC Lateral RESURF MOSFETs on Carbon-Face Substrates", Materials Science Forum, Vols. 483-485, pp. 805-808, 2005
Online since
May 2005
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Price
$32.00
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