Paper Title:
Analysis of Low On-Resistance in 4H-SiC Double-Epitaxial MOSFET
  Abstract

In our previous study, the on-resistance of the SiC-based vertical MOSFET had been reduced in double-epitaxial MOSFET (DEMOSFET). The device exhibited an on-resistance (Rons) of 8.5 mWcm2 with a blocking voltage (Vbr) of 600 V. This study analyzed the characteristics of the DEMOSFET using a numerical simulation. The results showed the trade-off relationship between the specific on-resistance and the blocking characteristics when the concentration of the nitrogen ions increases in the surface of the n-type region between the p-wells. Specially, the specific on-resistance was drastically improved by increasing the concentration of the nitrogen ions. The thick gate oxide on the n-type region between the p-wells had an advantage to suppress the electric field in the gate oxide.

  Info
Periodical
Materials Science Forum (Volumes 483-485)
Edited by
Roberta Nipoti, Antonella Poggi and Andrea Scorzoni
Pages
813-816
DOI
10.4028/www.scientific.net/MSF.483-485.813
Citation
S. Harada, M. Okamoto, T. Yatsuo, K. Fukuda, K. Arai, "Analysis of Low On-Resistance in 4H-SiC Double-Epitaxial MOSFET", Materials Science Forum, Vols. 483-485, pp. 813-816, 2005
Online since
May 2005
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