In order to provide higher driving forces for densification of Indium-Tin oxide(ITO) sputtering targets, nano-sized ITO powders with uniform size distribution were prepared by solvothermal process. In this study, sintered bodies were densified by a spark plasma sintering (SPS) process at 950 oC. The experiments conduct the SPS method in order to achieve the highest density of sputtering targets. The phase and relative density of ITO sputtering targets were identified by X-ray diffractometry_(XRD) and Archimedes method, respectively. The surface microstructure and quanitative analysis of the targets were observed by scanning scanning electron microscopy (SEM), and ITO powders particle were measured by SEM, XRD-LB methods.