Ultra-Hard Nanostructured Al-Si Thin Films |
| Journal |
Materials Science Forum (Volume 494) |
| Volume |
Current Research in Advanced Materials and Processes |
| Edited by |
Dragan P. Uskokovic, Slobodan K. Milonjic, Djan I. Rakovic |
| Pages |
13-18 |
| DOI |
10.4028/www.scientific.net/MSF.494.13 |
| Online since |
September, 2005 |
| Authors |
Velimir Radmilović,
D. Mitlin,
U. Dahmen
|
| Keywords |
Aluminium Silicon Alloy, e-Beam Deposition, Nanocomposite, Nanocrystalline Alloy, Nano-Structure, Thin Film |
| Abstract |
We show that it is possible to use high rate co-evaporation of Al and Si onto room
temperature substrates to achieve a novel two-phase nanoscale microstructure. These nanocomposites have a hardness as high as 4GPa (Al-23at.%Si), and display noticeable plasticity. Films with compositions of Al-12at.%Si and pure Al (used as baseline) were analyzed using transmission electron microscopy (TEM). The scale of the Al-12at.%Si microstructure is an order of magnitude finer compared to that of pure Al films. It consists of a dense distribution of spherical nanoscale Si particles separating irregularly-shaped small Al grains. These new
structures may have a mechanical performance advantage over conventional single phase nanomaterials due to the role of the dispersed hard phase in promoting strain hardening. |
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