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Molecular Orbital Study on Adsorption Process of Silica Cluster on Polyimide Surface

Journal Materials Science Forum (Volume 502)
Volume New Frontiers of Processing and Engineering in Advanced Materials
Edited by Masaaki Naka and Toshimi Yamane
Pages 63-68
DOI 10.4028/www.scientific.net/MSF.502.63
Citation Akinori Fujinami et al., 2005, Materials Science Forum, 502, 63
Online since December, 2005
Authors Akinori Fujinami, Shigenobu Ogata, Yoji Shibutani, Kenichi Yamamoto
Keywords Adsorption Process, Minimum Energy Paths, Polyimide, Silica Cluster, Sorption Energy
Abstract

Process of a silica cluster on a polyimide surface was simulated by atomistic calculations combining the semi-empirical molecular orbital method and algorithms that can find the optimal path of a chemical bonding process. Specifically, we estimated the activation and sorption energies in the process. From the simulations, we found that chemical bonding occurs between a silica cluster and the polyimide substrate surface. In the adsorption processes, those reactions between the silica cluster and the polyimide surface which involve Si-O bonding between the cluster and the polyimide are the most probable.

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