Molecular Orbital Study on Adsorption Process of Silica Cluster on Polyimide Surface |
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| Journal | Materials Science Forum (Volume 502) |
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| Volume | New Frontiers of Processing and Engineering in Advanced Materials |
| Edited by | Masaaki Naka and Toshimi Yamane |
| Pages | 63-68 |
| DOI | 10.4028/www.scientific.net/MSF.502.63 |
| Citation | Akinori Fujinami et al., 2005, Materials Science Forum, 502, 63 |
| Online since | December, 2005 |
| Authors | Akinori Fujinami, Shigenobu Ogata, Yoji Shibutani, Kenichi Yamamoto |
| Keywords | Adsorption Process, Minimum Energy Paths, Polyimide, Silica Cluster, Sorption Energy |
| Abstract | Process of a silica cluster on a polyimide surface was simulated by atomistic calculations combining the semi-empirical molecular orbital method and algorithms that can find the optimal path of a chemical bonding process. Specifically, we estimated the activation and sorption energies in the process. From the simulations, we found that chemical bonding occurs between a silica cluster and the polyimide substrate surface. In the adsorption processes, those reactions between the silica cluster and the polyimide surface which involve Si-O bonding between the cluster and the polyimide are the most probable. |
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