Progress on Advanced Manufacture for Micro/Nano Technology 2005
Materials Science Forum Volumes 505 - 507
doi:10.4028/www.scientific.net/MSF.505-507
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p181
Compensation Control of Cutting Tool Position in Machining Non-Axisymmetric Optic Mirror Surface
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263 K
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Authors: Yuan Liang Zhang, Zhi Min Zhou, Xu Zhang
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p187
Measurement of Five DOF Motion Errors in the Ultra Precision Feed Tables
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431 K
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Authors: Yoon Jin Oh, Chun Hong Park, J.H. Hwang, Deug Woo Lee
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p193
Investigation of Electron Beam Welding on AZ91D-F Extrusive Plates
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719 K
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Authors: C.T. Chi, C.G. Chao, C.A. Huang, C.H. Lee
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p199
Study on Shrinkage of Injection Molding Biodegradable Materials
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255 K
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Authors: Yih Lin Cheng, Ying Wei Lee
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p205
Study on the Predictive Model for Shear Strength in Laser Welding Stainless Steel
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248 K
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Authors: Wen T. Chien, S.W. Chang
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p211
Fabrication of Light Guiding Plate of Double-Side Hot-Embossing
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427 K
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Authors: Chao Heng Chien, Zhi Peng Chen
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p217
Fabrication of Micro Components to Silicon Wafer Using EDM Process
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560 K
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Authors: Feng Tsai Weng, Chen Siang Hsu, Wen Feng Lin
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p223
A Study of Liquid Cooling Heat Sink Fabrication and Development in Notebook
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272 K
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Authors: A Cheng Wang, Kuo Zoo Liang, C.C. Liu, C.K. Yang
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p229
Study on Optical Properties of Microstructure of Lightguiding Plate for Micro Injection Molding and Micro Injection-Compression Molding
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386 K
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Authors: Yung Kang Shen, H.J. Chang, C.T. Lin
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p235
Development of a Novel Micro Wire-EDM Mechanism for the Fabricating of Micro Parts
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1 M
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Authors: Chang Sheng Lin, Yunn Shiuan Liao, Shun Tong Chen
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p241
Predictive Modeling of Scuffing Performance of Gear Oil with MoDTC Using Response Surface Methodology
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324 K
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Authors: Yeau Ren Jeng, Shen Jenn Hwang
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p247
The Development of a Novel Optoelectronic Level
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260 K
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Authors: Wen Yuh Jywe, Chun Jen Chen
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p253
A Fundamental Modeling Approach for Nano-Grinding of Silicon Wafers
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468 K
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Authors: Hong Tsu Young, Hung Yi Huang, Ying Jay Yang
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p259
A Fast Auto-Focusing Method for Laser Diode Machine
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225 K
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Authors: Kuang Chyi Lee
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p265
Characterization of Polycrystalline Si Films Produced by ArF Excimer Laser Irradiation
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762 K
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Authors: Ta Tung Chen, C.Y. Chang