Paper Title:
Fabrication of Nano-Sized Gold Dot Array Using Bi-Layer Nano Imprint Lithography
  Abstract

UV nano imprint lithography (UV NIL) that uses a monomer based UV curable monomer resin is proposed as a method of imprinting at low temperature and pressure. The fabrication of high fidelity patterns on a topographical substrate is a formidable challenge. To accomplish this, the use of bi-layer nano imprint lithography, which involves the use of an easily removable under-layer and an imprinted pattern, is proposed. We hypothesized that by etching the under layer by oxygen RIE, we might be able to build the bi-layer patterns for easy lift-off and fabricate nano-sized metal patterns through this lift-off process.

  Info
Periodical
Materials Science Forum (Volumes 510-511)
Edited by
Hyung Sun Kim, Yu Bao Li and Soo Wohn Lee
Pages
446-449
DOI
10.4028/www.scientific.net/MSF.510-511.446
Citation
K. Y. Yang, S. H. Hong, H. Lee, J. W. Choi, "Fabrication of Nano-Sized Gold Dot Array Using Bi-Layer Nano Imprint Lithography", Materials Science Forum, Vols. 510-511, pp. 446-449, 2006
Online since
March 2006
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Price
$32.00
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