Paper Title:
Design of Automatic Matching System for Very High Frequency Plasma-Enhanced Processes
  Abstract

Since it can change electron energy distribution functions, very high frequency (VHF) plasma has gained significant attention as a promising new class of plasma. We demonstrate an automatic matching system for VHF plasma, that works in very wide ranges. A matching system was prepared using conventional variable capacitors. Reflection coefficient at the input of the matching circuits was measured with a directional coupler. A new calculation method for automatic matching based on numerical models for the circuit was developed, and the performance of the automatic matching system was evaluated using a load emulator. These results revealed that the system has an automatic matching capability for the entire range of the covering load area.

  Info
Periodical
Edited by
Yukichi Umakoshi and Shinji Fujimoto
Pages
239-242
DOI
10.4028/www.scientific.net/MSF.512.239
Citation
Y. Yoshizako, D. Matsuno, "Design of Automatic Matching System for Very High Frequency Plasma-Enhanced Processes", Materials Science Forum, Vol. 512, pp. 239-242, 2006
Online since
April 2006
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Price
$32.00
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