Paper Title:
Influence of the Crystallographic Orientation on the Mechanical Behaviour of Sputtered Silver Thin Films
  Abstract

In this research work, sputtering was used to deposit silver thin films under different deposition parameters, namely by changing deposition pressure, substrate bias and discharge gas. The main objective of the present work was to study the influence of the textured grain in the mechanical behaviour of the modified surfaces. The deposition rate, chemical composition (EPMA), morphology (SEM) and hardness were also assessed. In the slide alternating wear tests, where poly(tetrafluoroethylene) (PTFE) was used as counterbody, the loads varied from 10 to 30 N. One of the major conclusions of this work is that the thin films with the strongest (111) preferential crystallographic orientation correspond to the highest deposition rate. These sample present higher hardness and lower wear coefficient if compared with other orientations

  Info
Periodical
Materials Science Forum (Volumes 514-516)
Edited by
Paula Maria Vilarinho
Pages
1140-1144
DOI
10.4028/www.scientific.net/MSF.514-516.1140
Citation
A. P. Piedade, G. Gomez, M. T. Vieira, M. Staia, "Influence of the Crystallographic Orientation on the Mechanical Behaviour of Sputtered Silver Thin Films", Materials Science Forum, Vols. 514-516, pp. 1140-1144, 2006
Online since
May 2006
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