Paper Title:
Stress and Texture Analysis in Thin Films and Coatings by X-Ray Diffraction
  Abstract

The thin and textured coatings present a double difficulty for characterization by conventional X-ray diffraction. Their shallow depth reduces the diffracted intensity and allows the interference of the underlying material. Frequently they present a crystallographic texture which limits the number of orientations that provide good intensity and induces anisotropy effects on their mechanical behavior. Reliable results can be determined using diffraction geometry of lowincidence angle. This paper describes the application of the technique to several films, characterized by thicknesses of the order of 1 μm and crystallographic textures. Examples are proposed of chromium films applied by PVD on molybdenum substrates, decorative electroplated coatings, and aluminum coatings used for interconnections in microelectronic circuits. The Cr films are 1.5 μm thick and exhibit a strong <100> fiber texture. The decorative coatings were studied both on the nickel undercoat and in the Cr top layer. Results are presented for chromium where tensile stresses and a <110> fiber texture were observed. The Al films are 1.0 μm thick. Some samples were heattreated at different annealing temperatures. Tensile stresses were always observed, which increase in the annealed samples.

  Info
Periodical
Materials Science Forum (Volumes 514-516)
Edited by
Paula Maria Vilarinho
Pages
1613-1617
DOI
10.4028/www.scientific.net/MSF.514-516.1613
Citation
J.C.P. Pina, M. J. Marques, J.M.M. dos Santos, A. M. Dias, "Stress and Texture Analysis in Thin Films and Coatings by X-Ray Diffraction", Materials Science Forum, Vols. 514-516, pp. 1613-1617, 2006
Online since
May 2006
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$32.00
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