Microstructure and Thermal Features of a-Si:H and nc-Si:H Thin Films Produced by Rf Sputtering |
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| Journal | Materials Science Forum (Volumes 514 - 516) |
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| Volume | Advanced Materials Forum III |
| Edited by | Paula Maria Vilarinho |
| Pages | 23-27 |
| DOI | 10.4028/www.scientific.net/MSF.514-516.23 |
| Citation | V. Thaiyalnayaki et al., 2006, Materials Science Forum, 514-516, 23 |
| Online since | May, 2006 |
| Authors | V. Thaiyalnayaki, M.Fátima Cerqueira, Francisco Macedo, João Alves Ferreira |
| Keywords | Nanocrystalline Silicon, Structure, Thermal Property |
| Abstract | Amorphous and nanocrystalline silicon thin films have been produced by reactive r.f. sputtering and their microstructure, optical and thermal properties were evaluated. A good correlation was found between the microstructure determined by Raman spectroscopy and X- ray diffraction and the thermal transport parameters. |
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