Paper Title:
CVD of CrO2 Thin Films: Influence of the Deposition Parameters on their Structural and Magnetic Properties
  Abstract

This work reports on the synthesis of CrO2 thin films by atmospheric pressure CVD using chromium trioxide (CrO3) and oxygen. Highly oriented (100) CrO2 films containing highly oriented (0001) Cr2O3 were grown onto Al2O3(0001) substrates. Films display a sharp magnetic transition at 375 K and a saturation magnetization of 1.92 µB/f.u., close to the bulk value of 2 µB/f.u. for the CrO2.

  Info
Periodical
Materials Science Forum (Volumes 514-516)
Edited by
Paula Maria Vilarinho
Pages
284-288
DOI
10.4028/www.scientific.net/MSF.514-516.284
Citation
A. F.S. Mota de Oliveira, A. J. Silvestre, P. M. Sousa, O. Conde, M. A. Rosa, M. Godinho, "CVD of CrO2 Thin Films: Influence of the Deposition Parameters on their Structural and Magnetic Properties", Materials Science Forum, Vols. 514-516, pp. 284-288, 2006
Online since
May 2006
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