Paper Title:
Optimization of Deposition Parameters for Thin Silicon Films on Flexible Substrates in a Hot-Wire Chemical Vapor Deposition Reactor
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Periodical
Materials Science Forum (Volumes 514-516)
Edited by
Paula Maria Vilarinho
Pages
475-482
DOI
10.4028/www.scientific.net/MSF.514-516.475
Citation
P. Alpuim, M. Ribeiro, S. Filonovich, "Optimization of Deposition Parameters for Thin Silicon Films on Flexible Substrates in a Hot-Wire Chemical Vapor Deposition Reactor", Materials Science Forum, Vols. 514-516, pp. 475-482, 2006
Online since
May 2006
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