Paper Title:

Performance Comparison of 1.5kV 4H-SiC Buried Channel and Lateral Channel JBS Rectifiers

Periodical Materials Science Forum (Volumes 527 - 529)
Main Theme Silicon Carbide and Related Materials 2005
Edited by Robert P. Devaty, David J. Larkin and Stephen E. Saddow
Pages 1159-1162
DOI 10.4028/www.scientific.net/MSF.527-529.1159
Citation Lin Zhu et al., 2006, Materials Science Forum, 527-529, 1159
Online since October, 2006
Authors Lin Zhu, T. Paul Chow, Kenneth A. Jones, Charles J. Scozzie, Anant K. Agarwal
Keywords 4H-SiC, Junction Barrier Schottky Diode (JBS), Rectifier, Schottky
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Abstract

We theoretically and experimentally compare the performance of a new JBS rectifier structure, the Buried Channel JBS (BC-JBS) rectifier, with that of the Lateral Channel JBS (LC-JBS) rectifier with 1.5kV blocking capability in 4H-SiC. The BC-JBS rectifier employs buried p-type regions to create a vertical JFET region to reduce the surface electric field at Schottky contact during reverse blocking while the LC-JBS rectifier adds a lateral channel together with the vertical JFET region to protect the surface Schottky interface during high-voltage blocking conditions. The LC-JBS rectifier offers low reverse leakage current while the BC-JBS rectifier demonstrates lower specific on-resistance. The optimized LC-JBS rectifiers show low forward drop (<1.8V) with PiN-like reverse characteristics.