Paper Title:
Extracting Activation and Compensation Ratio from Aluminum Implanted 4H-SiC by Modeling of Resistivity Measurements
  Abstract

Characterization of post implantation annealing steps is done by extracting the activation and compensation data of implanted Al atoms. Usually, this is done by Hall measurements. The preparation of Hall samples and temperature dependent Hall measurements, however, are rather complex compared to, e.g., temperature dependent resistivity measurements by 4-point probing. Therefore, a model for extracting relevant electrical parameters from resistivity data has been developed. The model is based on the neutrality equation and a temperature dependent mobility model.

  Info
Periodical
Materials Science Forum (Volumes 527-529)
Edited by
Robert P. Devaty, David J. Larkin and Stephen E. Saddow
Pages
827-830
DOI
10.4028/www.scientific.net/MSF.527-529.827
Citation
M. Rambach, L. Frey, A. J. Bauer, H. Ryssel, "Extracting Activation and Compensation Ratio from Aluminum Implanted 4H-SiC by Modeling of Resistivity Measurements", Materials Science Forum, Vols. 527-529, pp. 827-830, 2006
Online since
October 2006
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$32.00
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