Paper Title:
High Temperature Operation of Silicon Carbide Schottky Diodes with Recoverable Avalanche Breakdown
  Abstract

4H-SiC diodes with nickel silicide (Ni2Si) and molybdenum (Mo) Schottky contacts have been fabricated and characterised at temperature up to 400°C. Room temperature boron implantation has been used to form a single zone junction termination extension. Both Ni2Si and Mo diodes revealed unchanging ideality factors and barrier heights (1.45 and 1.3 eV, respectively) at temperatures up to 400°C. Soft recoverable breakdowns were observed both in Ni2Si and Mo Schottky diodes at voltages above 1450 V and 3400 V depending on the epitaxial structure used. These values are about 76% and 94% of the ideal avalanche breakdown voltages. The Ni2Si diodes revealed positive temperature coefficients of breakdown voltage at temperature up to 240°C.

  Info
Periodical
Materials Science Forum (Volumes 527-529)
Edited by
Robert P. Devaty, David J. Larkin and Stephen E. Saddow
Pages
931-934
DOI
10.4028/www.scientific.net/MSF.527-529.931
Citation
K. Vassilevski, I. P. Nikitina, P. Bhatnagar, A. B. Horsfall, N. G. Wright, A. G. O'Neill, M. J. Uren, K. P. Hilton, A.G. Munday, A.J. Hydes, C. M. Johnson, "High Temperature Operation of Silicon Carbide Schottky Diodes with Recoverable Avalanche Breakdown", Materials Science Forum, Vols. 527-529, pp. 931-934, 2006
Online since
October 2006
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