Paper Title:
Study Morphology Transitions in Self-Assembled Triblock Copolymer Thin Films with Nanostructures by AFM
  Abstract

As a “bottom-up” approach to nanostructures for nanofabrication, self-assembled block copolymer thin films have received much attention not only thanks to the scale of the microdomains but also due to the convenient shape tunability. In order to realize applications of self-assembled block copolymer thin films in nanotechnologies, control over microdomain spatial and orientational order is paramount. In this paper, using atomic force microscopy (AFM), we studied systemically nanostructure transitions induced by post-solvent annealing in self-assembled block copolymer thin films. Furthermore, a variety of thin films with well-ordered nanostructures, which can be employed as templates for nanotechnologies, have been realized simply and at low cost.

  Info
Periodical
Materials Science Forum (Volumes 532-533)
Edited by
Chengyu Jiang, Geng Liu, Dinghua Zhang and Xipeng Xu
Pages
165-168
DOI
10.4028/www.scientific.net/MSF.532-533.165
Citation
Y. Z. Cao, S. Dong, Y. C. Liang, T. Sun, "Study Morphology Transitions in Self-Assembled Triblock Copolymer Thin Films with Nanostructures by AFM", Materials Science Forum, Vols. 532-533, pp. 165-168, 2006
Online since
December 2006
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Price
$32.00
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