Paper Title:
Laser Fabrication of Low Resistivity Electrode on Glass
  Abstract

A method for low resistivity resistor on transparent substrate with laser induced plasma assisted by ablation and laser annealing was described. The diffusion distribution for metallization was measured with XPS. The surface profile was analysed with SEM. The minimum resistivity we got was 0.1 /Sq. It demonstrates that the electronic thin film obtained has a very good conductivity. The most important factors for forming electrically conducting films on the transparent substrate are laser fluence, beam scanning and pulse repetition rate. This technology will be useful in the fabrication of LCD electrode, glass defused resistor and circuit on glass.

  Info
Periodical
Materials Science Forum (Volumes 532-533)
Edited by
Chengyu Jiang, Geng Liu, Dinghua Zhang and Xipeng Xu
Pages
345-348
DOI
10.4028/www.scientific.net/MSF.532-533.345
Citation
D. J. Wu, J. Zhuang, X. Y. Wang, R. K. Kang, F. L. Zhao, "Laser Fabrication of Low Resistivity Electrode on Glass", Materials Science Forum, Vols. 532-533, pp. 345-348, 2006
Online since
December 2006
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Price
$32.00
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