Paper Title:
TiNi Shape Memory Alloys for MEMS: Thin Film Deposition, Thermophysical Properties and Laser Micromachining Characteristics
  Abstract

The growth of TiNi thin films by ion beam sputter deposition using a Kaufmann type ion source is described. Argon ions are used to sputter separate Ti and Ni targets to deposit nearequiatomic TiNi thin films. Typically, ion energies and current densities of 1500 eV and 1 mA cm-2 respectively are used, with an argon overpressure of around 0.05 mtorr, to achieve deposition rates of order 1 μm hr-1. The thermophysical properties of the deposited films were investigated by thermal imaging. Patterning of TiNi films and foils with micrometre resolution using KrF excimer laser ablation at 248 nm wavelength, with beam fluence up to 2.5 J cm-2, 15 ns pulse duration and pulse rates up to 100 Hz has also been investigated.

  Info
Periodical
Materials Science Forum (Volumes 539-543)
Main Theme
Edited by
T. Chandra, K. Tsuzaki, M. Militzer , C. Ravindran
Pages
3151-3156
DOI
10.4028/www.scientific.net/MSF.539-543.3151
Citation
S.T. Davies, "TiNi Shape Memory Alloys for MEMS: Thin Film Deposition, Thermophysical Properties and Laser Micromachining Characteristics", Materials Science Forum, Vols. 539-543, pp. 3151-3156, 2007
Online since
March 2007
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