Paper Title:
Photocatalytic and Photoelectrochemical Properties of Nitrogen-Substituted TiO2 Thin Films Prepared by an RF Magnetron Sputtering Deposition Method
  Abstract

Highly nitrogen-substituted TiO2 (N-TiO2) thin film photocatalysts were prepared by a radio-frequency magnetron sputtering (RF-MS) deposition method. N-TiO2 thin films with low nitrogen concentration (0.5%) exhibited a small absorption band as a shoulder in the 400-500 nm wavelength region, indicating that isolated N 2p orbitals are formed above the O 2p orbitals. However, N-TiO2 with higher nitrogen concentration (6%) exhibited a sharp absorption edge at 500 nm, indicating that visible light absorption is due to a band gap transition. These N-TiO2 thin films could operate as photocatalysts to decompose 2-propanol diluted in water under visible light. The band structure of N-TiO2 was also determined by photoelectrochemical measurements and H2 and O2 evolution was carried out from an aqueous solution involving sacrificial reagents.

  Info
Periodical
Materials Science Forum (Volumes 544-545)
Edited by
Hyungsun Kim, Junichi Hojo and Soo Wohn Lee
Pages
107-110
DOI
10.4028/www.scientific.net/MSF.544-545.107
Citation
M. Kitano, T. Kudo, M. Matsuoka, M. Ueshima, M. Anpo, "Photocatalytic and Photoelectrochemical Properties of Nitrogen-Substituted TiO2 Thin Films Prepared by an RF Magnetron Sputtering Deposition Method", Materials Science Forum, Vols. 544-545, pp. 107-110, 2007
Online since
May 2007
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Price
$32.00
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