Paper Title:
A Comparison of the Mechanical Properties of RF- and DC- Sputter-Deposited Cr Thin Films
  Abstract

Chromium (Cr) films were deposited on plain carbon steel sheets by DC and RF magnetron sputtering as well as by electroplating. Effects of DC or RF sputtering power on the deposition rate and properties such as hardness and surface roughness of the Cr films were investigated. X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microcopy (SEM) analyses were performed to investigate the crystal structure, surface roughness, thickness of the Cr films. The deposition rate, hardness and surface roughness of the Cr film deposited by either DC or RF sputtering increase with the increase of sputtering power. The deposition rate and hardness of the Cr film deposited by DC sputtering are higher than those of the Cr film deposited by RF sputtering, but RF sputtering offers smoother surface. The sputter-deposited Cr film is harder and has a smoother surface than the electroplated one.

  Info
Periodical
Materials Science Forum (Volumes 546-549)
Edited by
Yafang Han et al.
Pages
1695-1698
DOI
10.4028/www.scientific.net/MSF.546-549.1695
Citation
M. W. Park, W. W. Lee, J. G. Lee, C. M. Lee, "A Comparison of the Mechanical Properties of RF- and DC- Sputter-Deposited Cr Thin Films", Materials Science Forum, Vols. 546-549, pp. 1695-1698, 2007
Online since
May 2007
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