Paper Title:
Ti-N-C Films Deposited by Ion Beam Assisted MF Twin Targets Unbalanced Magnetron Sputtering
  Abstract

Using Hall ion source assisted MF twin targets unbalanced magnetron sputtering, series of Ti/TiN, Ti/TiN/Ti(C,N) and Ti/TiN/Ti(C,N)/TiC hard anti-wear films are deposited on different materials like stainless and high speed steels by changing atmosphere, bias mode, sputtering and ion beam assisted currents. The color, crystal structure, hardness and binding force of film are tested and analyzed, respectively. Experimental results show that color of film is sensitive to atmosphere, slight change of atmosphere can influence the coating’s color seriously. The preferred orientation of Ti(C,N) films prepared by MF twin targets unbalanced magnetron sputtering has no obvious change compared with the film deposited by other PVD technologies. The substrate material has great influence on film’s hardness, binding energy and surface modification. The application of Hall current can effectively improve the binding force between film and substrate.

  Info
Periodical
Materials Science Forum (Volumes 546-549)
Edited by
Yafang Han et al.
Pages
1729-1734
DOI
10.4028/www.scientific.net/MSF.546-549.1729
Citation
Y. Huang, S. N. Sun, Y. F. Wu, S. G. Ma, Y. Zhou, "Ti-N-C Films Deposited by Ion Beam Assisted MF Twin Targets Unbalanced Magnetron Sputtering", Materials Science Forum, Vols. 546-549, pp. 1729-1734, 2007
Online since
May 2007
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Shu Yong Tan, Xu Hai Zhang, Xiang Jun Wu, Feng Fang
Abstract:CrNx films were synthesized under graded/constant bias by DC magnetron sputtering. In the present work, the graded bias deposited CrNx films...
1476
Authors: Ping Luan, Jian Sheng Xie, Jin Hua Li
Chapter 3: Surface, Subsurface, and Interface Phenomena
Abstract:Using magnetron sputtering technology, the CuInSi thin films were prepared by multilayer synthesized method. The structure of CuInSi films...
822
Authors: Sheng Zhao Wang, Dan Zhang, Ying Peng Yin, Ming Ji Shi, Da Yong Huang, Jia Hui Yu
V. Related Materials
Abstract:By PECVD deposition technology, we mainly investigated the influence of PRF (radio frequency power) on glass/steel-based intrinsic...
426
Authors: Fei Xiong Mao, Tao Liu, Shi Wei Liu, Jing Kun Yu
Chapter 16: Sustainable Manufacturing Technologies
Abstract:Mg films were prepared by magnetron sputtering on zirconia substrate. The surface morphology, structure and adhesion performance were...
2834
Authors: C.L. Zhong, P.A. Wei, L.E. Luo
Chapter 1: Material Engineering and its Application Technology
Abstract:A series of Ti1-xAlxN thin films were deposited by reactive magnetron sputtering. The content, microstructure and the hardness of the thin...
93