Particle-In-Cell Modelling of a Neutral Beam Source for Material Processing in Nanoscale Structures Fabrication |
|
| Journal | Materials Science Forum (Volume 555) |
|---|---|
| Volume | Research Trends in Contemporary Materials Science |
| Edited by | Dragan P. Uskoković, Slobodan K. Milonjić and Dejan I. Raković |
| Pages | 47-52 |
| DOI | 10.4028/www.scientific.net/MSF.555.47 |
| Citation | M. Radmilović-Radjenović et al., 2007, Materials Science Forum, 555, 47 |
| Online since | September, 2007 |
| Authors | M. Radmilović-Radjenović, Z.Lj. Petrović, Željka Nikitović, A. Strinić, V. Stojanović, Aleksandra Nina, B. Radjenović |
| Keywords | Charging Damage, Etching, Material Processing, Nanoscale Structure, Neutralization Efficiency |
| Abstract | Neutral beam processing has evolved into one of the most promising methods for overcoming plasma process induced damage. Surface treatment by neutrals avoids problems with surface charging effects, frequently encountered when using common ion treatment, especially for low k-materials. In this paper, the influence of various parameters on the neutralization of ion beams in Ar-CF4 mixture based on a Particle in Cell with Monte Carlo collisions (PIC/MCC) simulation is studied. The efficiency of neutralization has been treated by considering both surface neutralization of ions and collisions of ions in the gas. |
| Full Paper | 
Get the full paper by clicking here
|
First page example
