Numerical Modeling of RF Magnetron Sputtering with Metallic or Dielectric Target |
| Journal |
Materials Science Forum (Volume 555) |
| Volume |
Research Trends in Contemporary Materials Science |
| Edited by |
Dragan P. Uskoković, Slobodan K. Milonjić and Dejan I. Raković |
| Pages |
65-71 |
| DOI |
10.4028/www.scientific.net/MSF.555.65 |
| Online since |
September, 2007 |
| Authors |
T. Makabe,
T. Yagisawa
|
| Keywords |
Physical Sputtering, RF Magnetron Plasma, Target Erosion Profile |
| Abstract |
A self-consistent modeling of two-dimensional and temporal (2D-t) structures of RF
magnetron plasma with a metallic (copper) and a dielectric (SiO2) target is performed at 5 mTorr in
argon by using plasma hybrid model consisting of a particle-in-cell/Monte Carlo (PIC/MC)
simulation for electrons and the relaxation continuum (RCT) model for ions. The erosion profiles of
both targets are numerically predicted through the flux velocity distribution of ions incident on the
surface. The mechanism of plasma maintenance in a dielectric target is quite different from that in a
metallic one. Two major differences exist in an erosion profile between both targets. One is the
presence of dual peaks in the erosion profile of the dielectric target. The other is the discrepancy in
the position of the maxima between incident ion flux and erosion depth on the dielectric target.
These are direct influences of the radially localized structure in an interfacial sheath based on the
charge accumulation on a dielectric surface. |
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