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Hot Electron Induced Current Collapse in AlGaN/GaN HEMTs

Journal Materials Science Forum (Volumes 556 - 557)
Volume Silicon Carbide and Related Materials 2006
Edited by N. Wright, C.M. Johnson, K. Vassilevski, I. Nikitina and A. Horsfall
Pages 1035-1038
DOI 10.4028/www.scientific.net/MSF.556-557.1035
Citation Akira Nakajima et al., 2007, Materials Science Forum, 556-557, 1035
Online since September, 2007
Authors Akira Nakajima, Shuichi Yagi, Mitsuaki Shimizu, Kazuhiro Adachi, Hajime Okumura
Keywords AlGaN/GaN HEMT, Current Collapse, Device Simulation, SiNx, Titania (TiO2)
Abstract

The mechanism of drain current collapse in AlGaN/GaN high electron mobility transistors (HEMTs) was investigated. Current collapse was clearly observed for TiO2 passivated HEMTs. However, no evidence of current collapse was apparent for SiNx passivated HEMTs. This suggests that AlGaN surface traps play a major role in current collapse. The experimental results were compared with numerical device simulation results. The device simulations were performed taking into account hot electron generation and deep traps at the AlGaN surface. The simulated drain current transients were consistent with the degradation and recovery behavior of the experimental results. These results indicate that current collapse is caused by the trapping of hot electrons in deep levels at the AlGaN surface.

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