Paper Title:
Very High Growth Rate Epitaxy Processes with Chlorine Addition
  Abstract

The growth rate of 4H-SiC epi layers has been increased by a factor 19 (up to 112 μm/h) with respect to the standard process with the introduction of HCl in the deposition chamber. The epitaxial layers grown with the addition of HCl have been characterized by electrical, optical and structural characterization methods. An optimized process without the addition of HCl is reported for comparison. The Schottky diodes, manufactured on the epitaxial layer grown with the addition of HCl at 1600 °C, have electrical characteristics comparable with the standard epitaxial process with the advantage of an epitaxial growth rate three times higher.

  Info
Periodical
Materials Science Forum (Volumes 556-557)
Edited by
N. Wright, C.M. Johnson, K. Vassilevski, I. Nikitina and A. Horsfall
Pages
157-160
DOI
10.4028/www.scientific.net/MSF.556-557.157
Citation
F. La Via, S. Leone, M. Mauceri, G. Pistone, G. Condorelli, G. Abbondanza, F. Portuese, G. Galvagno, S. Di Franco, L. Calcagno, G. Foti, G. L. Valente, D. Crippa, "Very High Growth Rate Epitaxy Processes with Chlorine Addition", Materials Science Forum, Vols. 556-557, pp. 157-160, 2007
Online since
September 2007
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