Paper Title:
Sodium Enhanced Oxidation of Si-Face 4H-SiC: A Method to Remove Near Interface Traps
  Abstract

We demonstrate how sodium enhanced oxidation of Si face 4H-SiC results in removal of near-interface traps at the SiO2/4H-SiC interface. These detrimental traps have energy levels close to the SiC conduction band edge and are responsible for low electron inversion channel mobilities (1-10 cm2/Vs) in Si face 4H-SiC metal-oxide-semiconductor field effect transistors. The presence of sodium during oxidation increases the oxidation rate and suppresses formation of these nearinterface traps resulting in high inversion channel mobility of 150 cm2/Vs in such transistors. Sodium can be incorporated by using carrier boats made of sintered alumina during oxidation or by deliberate sodium contamination of the oxide during formation of the SiC/SiO2 interface.

  Info
Periodical
Materials Science Forum (Volumes 556-557)
Edited by
N. Wright, C.M. Johnson, K. Vassilevski, I. Nikitina and A. Horsfall
Pages
487-492
DOI
10.4028/www.scientific.net/MSF.556-557.487
Citation
E. Ö. Sveinbjörnsson, F. Allerstam, H.Ö. Ólafsson, G. Gudjónsson, D. Dochev, T. Rödle, R. Jos, "Sodium Enhanced Oxidation of Si-Face 4H-SiC: A Method to Remove Near Interface Traps", Materials Science Forum, Vols. 556-557, pp. 487-492, 2007
Online since
September 2007
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Price
$32.00
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