Paper Title:
Performance of Low Resistivity Electrode Prepared by Electroless Plated for Amorphous Silicon Thin-Film Transistors
  Abstract

The TFTs array fabrication process for large-area TFT-LCD has been continuously developed for simplifying processing steps, improving performance and reducing cost in the process of mass production. In this study, the hydrogenated amorphous silicon (a-Si:H) TFTs with low resistivity electrodes , silver thin films, were prepared by using the selective deposition method that combined lift-off and electroless plated processes. This developed process can direct pattern the electrode of transistor devices without the etching process and provide ease processing steps. The as-deposited Ag films were annealed at 200 oC for 10 minutes under N2 atmosphere. The results shows that the adhesion properties can be enhanced and the resistivity has been improved from 6.0 μ,-cm, significantly decrease by 35%, of as-deposited Ag films by annealed. The thickness of Ag thin film is about 100 nm and the r. m. s roughness value is 1.54 nm. The a-Si:H TFT with Ag thin films as source and drain electrodes had a field effect mobility of 0.18 cm2/Vs, a threshold voltage of 2.65 V, and an on/off ratio of 3×104.

  Info
Periodical
Materials Science Forum (Volumes 561-565)
Main Theme
Edited by
Young Won Chang, Nack J. Kim and Chong Soo Lee
Pages
1165-1168
DOI
10.4028/www.scientific.net/MSF.561-565.1165
Citation
C. Y. Tsay, C. K. Lin, H. M. Lin, S. C. Chang, B. C. Chung, "Performance of Low Resistivity Electrode Prepared by Electroless Plated for Amorphous Silicon Thin-Film Transistors", Materials Science Forum, Vols. 561-565, pp. 1165-1168, 2007
Online since
October 2007
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Hong Long Ning, Chang Oh Jeong, Ki Yong Song, Sung Hen Cho, Jae Hong Kim, Dong Ju Yang, Jean Ho Song, Shi Yul Kim
Abstract:As we know, we normally used stacked aluminum bus line as the Gate or Source/Drain layer in LCD now, but the next general LCD needs larger...
329
Authors: Yu Xiang You, Yun Ye, Yi Jing Su, Qiao Zhi Tang, Tai Liang Guo
Abstract:Carbon nanotubes (CNTs) demonstrate attractive characteristics as cold cathode emitters for high aspect ratio, small radius of curvature,...
983
Authors: Kai Feng Qin, Lin Jun Wang, Ji Jun Zhang, Jia Hua Min, Xiao Yan Liang, Jian Huang, Ke Tang, Yi Ben Xia
Abstract:In this paper, the effects of different metal contact treatments were systemically investigated. The interfacial properties between Au and...
1298
Authors: Yang Xu, Sheng Zhi Hao, Xiang Dong Zhang, Min Cai Li, Chuang Dong
Abstract:The surface irradiation of 6063 aluminum alloy by high current pulsed electron was conducted with the aim of replacing the complicated...
77
Authors: Xiao Peng, Kai Yong Jiang
Chapter 4: Engineering Material, Energy Science and Dynamic System in Mechanical Engineering
Abstract:Metallization treating on the plastic surface without the mask technology was created by using a new method combining the laser technique...
765