Paper Title:
Microstructure and Electrical Properties of Nano Ni-Cr Thin-Films Fabricated by Magnetron Co-Sputtering Techniques
  Abstract

The nano Ni-Cr thin-film samples with different composition have been fabricated by a double-target magnetron co-sputtering equipment, through controlling the sputtering power, the substrate rotate speed, and the substrate temperature, The results showed that the grains sizes with polycrystalline microstructure were not greater than 10 nm. The crystal microstructure of Ni-Cr thin-films is Face Centered Cubic (FCC). The dominant texture in the Ni-Cr film was Ni (111) under this sputtering condition. The lattice parameters of Ni crystal and the inter-planar distances of Ni (111) increased by Cr solid-soluble in Ni crystal. The surface morphology of the thin-film samples is smooth and compact. The TCR (temperature coefficient of resistance) value of specimen 3 was 84~130 ppm/k, which show the specimen 3 was the most stable.

  Info
Periodical
Materials Science Forum (Volumes 561-565)
Main Theme
Edited by
Young Won Chang, Nack J. Kim and Chong Soo Lee
Pages
1201-1204
DOI
10.4028/www.scientific.net/MSF.561-565.1201
Citation
J. C. Zhou, J. W. Yan, "Microstructure and Electrical Properties of Nano Ni-Cr Thin-Films Fabricated by Magnetron Co-Sputtering Techniques", Materials Science Forum, Vols. 561-565, pp. 1201-1204, 2007
Online since
October 2007
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: S.C. Chen, T.Y. Kuo, Y.C. Lin, Po Cheng Kuo
Abstract:The experimental result shows that the preferred orientations of NiO thin films are closely related to the working pressure of argon. All of...
859
Authors: Ping Luan, Jian Sheng Xie, Jin Hua Li
Chapter 3: Surface, Subsurface, and Interface Phenomena
Abstract:Using magnetron sputtering technology, the CuInSi thin films were prepared by multilayer synthesized method. The structure of CuInSi films...
822
Authors: Xue Hui Wang, Wu Tang, Ji Jun Yang
Chapter 6: Material Design of Computer Aided
Abstract:The porous Cu film was deposited on soft PVDF substrate by magnetron sputtering at different sputtering pressure. The microstructure and...
1451
Authors: Wu Tang, Ji Jun Yang, Chi Ming Li
Chapter 2: Materials Science and Processing
Abstract:In this paper, Al2O3 thin film samples were deposited on Si-(100) substrate by electron beam evaporation with different thickness at...
161
Authors: Tai Long Gui, Si Da Jiang, Chun Cheng Ban, Jia Qing Liu
Chapter 2:Advanced Material Science and Technology
Abstract:AlN dielectric thin films were deposited on N type Si(100) substrate by reactive radio frequency magnetron sputtering that directly...
409