Surface Roughness Control of Zirconia Films Using a Novel Photoresponsive Precursor Molecule for Improving its Photocatalytic Activity
|
| Journal |
Materials Science Forum (Volume 569) |
| Volume |
Eco-Materials Processing and Design IX |
| Edited by |
Byungsei Jun, Hyungsun Kim, Chanwon Lee, Soo Wohn Lee |
| Pages |
13-16 |
| DOI |
10.4028/www.scientific.net/MSF.569.13 |
| Online since |
January, 2008 |
| Authors |
Kaori Nishizawa,
Takeshi Miki,
Eiji Watanabe,
Hiroshi Taoda
|
| Keywords |
Electric Field, Photocatalyst, Photoresponsive Precursor, Surface Roughness, ZrO2 Films |
| Abstract |
A novel photoresponsive zirconia (ZrO2) precursor solution was prepared using
zirconium tetra-n-butoxide, 4-(phenylazo)benzoic acid and ethyleneglycol monomethylether. Two
kinds of ZrO2 films were prepared using the photoresponsive ZrO2 precursor solution and by
dip-coating while applying an electric field to the substrates: one was the film prepared with
ultraviolet (UV) irradiation to the solution and as-deposited films; the other was the film prepared
without UV irradiation. It was found that the surface roughness of films was greatly changed by UV
irradiation. Furthermore, the photocatalytic activity of the rough film was greater than that of the
smooth film. |
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