Paper Title:
An Overview of ms Annealing for Deep Sub-Micron Activation
  Abstract

Millisecond annealing (MSA) has been developed over the last several years as a viable approach to achieve the high electrical activation, limited diffusion and high abruptness needed for junctions in the sub-65nm regime. This paper will provide an overview of the technology including the motivation, technology and some process results. Both main approaches for MSA, sub-melt laser and flash lamp annealing will be discussed as well as the potential challenges to bring these technologies into mainstream manufacturing.

  Info
Periodical
Materials Science Forum (Volumes 573-574)
Edited by
W. Lerch and J. Niess
Pages
257-267
DOI
10.4028/www.scientific.net/MSF.573-574.257
Citation
J. C. Gelpey, S. McCoy, D. Camm, W. Lerch, "An Overview of ms Annealing for Deep Sub-Micron Activation", Materials Science Forum, Vols. 573-574, pp. 257-267, 2008
Online since
March 2008
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Price
$32.00
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