Present Status of Deep UV Nitride Light Emitters |
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| Journal | Materials Science Forum (Volume 590) |
|---|---|
| Volume | Advances in Light Emitting Materials |
| Edited by | Bo Monemar, Martin Kittler, Hermann Grimmeiss |
| Pages | 141-174 |
| DOI | 10.4028/www.scientific.net/MSF.590.141 |
| Citation | Asif Khan et al., 2008, Materials Science Forum, 590, 141 |
| Online since | August, 2008 |
| Authors | Asif Khan, Krishnan Balakrishnan |
| Keywords | AlGaN, AlInGaN, Aluminium Nitride (AlN), Deep UV, Epitaxy, GaN, Growth, Laser Diode, Light-Emitting Diode (LED), MOCVD, Pulsed Lateral Overgrowth, UV |
| Abstract | Ultraviolet light emitting diodes with emission wavelengths less than 400 nm have been developed using the AlInGaN material system. Rapid progress in material growth, device fabrication and packaging enabled demonstration of deep-UV light-emitting devices with emission from 400 to 210 nm with varying efficiencies. For high aluminum alloy compositions needed for the shorter wavelength devices, these materials border between having material properties like conventional semiconductors and insulators, adding a degree of complexity to developing efficient light emitting devices. This chapter provides a review of III-nitride based UV light emitting devices including technical developments that allow for emission in the ultraviolet spectrum, and an overview of their applications in optoelectronic systems. |
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