12 kV 4H-SiC p-IGBTs with Record Low Specific On-Resistance |
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| Journal | Materials Science Forum (Volumes 600 - 603) |
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| Volume | Silicon Carbide and Related Materials 2007 |
| Edited by | Akira Suzuki, Hajime Okumura, Tsunenobu Kimoto, Takashi Fuyuki, Kenji Fukuda and Shin-ichi Nishizawa |
| Pages | 1187-1190 |
| DOI | 10.4028/www.scientific.net/MSF.600-603.1187 |
| Citation | Q. Jon Zhang et al., 2008, Materials Science Forum, 600-603, 1187 |
| Online since | September, 2008 |
| Authors | Q. Jon Zhang, Charlotte Jonas, Joseph J. Sumakeris, Anant K. Agarwal, John W. Palmour |
| Keywords | High Power, High Voltage, IGBT, On-Resistance, P-Channel, Silicon Carbide (SiC), Surge Capability |
| Abstract | DC characteristics of 4H-SiC p-channel IGBTs capable of blocking -12 kV and conducting -0.4 A (-100 A/cm2) at a forward voltage of -5.2 V at 25°C are demonstrated for the first time. A record low differential on-resistance of 14 mW×cm2 was achieved with a gate bias of -20 V indicating a strong conductivity modulation in the p-type drift region. A moderately doped current enhancement layer grown on the lightly doped drift layer effectively reduces the JFET resistance while maintains a high carrier lifetime for conductivity modulation. A hole MOS channel mobility of 12.5 cm2/V-s at -20 V of gate bias was measured with a MOS threshold voltage of -5.8 V. The blocking voltage of -12 kV was achieved by Junction Termination Extension (JTE). |
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