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Growth of 6H-SiC Single Crystals under Quasi-Equilibrium Conditions

Journal Materials Science Forum (Volumes 600 - 603)
Volume Silicon Carbide and Related Materials 2007
Edited by Akira Suzuki, Hajime Okumura, Tsunenobu Kimoto, Takashi Fuyuki, Kenji Fukuda and Shin-ichi Nishizawa
Pages 15-18
DOI 10.4028/www.scientific.net/MSF.600-603.15
Citation Emil Tymicki et al., 2008, Materials Science Forum, 600-603, 15
Online since September, 2008
Authors Emil Tymicki, Krzysztof Grasza, Władysław Hofman, Ryszard Diduszko, Rafał Bożek
Keywords 6H-SiC, Crystal Growth, PVT, Quasi-Equilibrium Condition, Reduction of Micropipe
Abstract

Silicon carbide single crystals grown by the seeded physical vapour transport method have been investigated. These crystals were grown on the Si-face (0001) of 6H-SiC seeds. The growth proceeded under quasi-equilibrium conditions with the growth rate in the range 0.05-0.2 mm/h, that was extremely low as compared to used in standard growth processes. The shape and morphology of the crystallization fronts have been studied. Moreover, defects in crystals and wafers cut from these crystals were examined by optical and atomic force microscopy combined with KOH etching and X-Ray diffraction.

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