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Bulk SiC Crystal Growth at Constant Growth Rate Utilizing a New Design of Resistive Furnace

Journal Materials Science Forum (Volumes 600 - 603)
Volume Silicon Carbide and Related Materials 2007
Edited by Akira Suzuki, Hajime Okumura, Tsunenobu Kimoto, Takashi Fuyuki, Kenji Fukuda and Shin-ichi Nishizawa
Pages 27-30
DOI 10.4028/www.scientific.net/MSF.600-603.27
Citation Eugene Y. Tupitsyn et al., 2008, Materials Science Forum, 600-603, 27
Online since September, 2008
Authors Eugene Y. Tupitsyn, Alexander Galyukov, Maxim V. Bogdanov, Alexey Kulik, Mark S. Ramm, Yuri N. Makarov, Tangali S. Sudarshan
Keywords 4H-SiC, Gradient, Growth Rate, Modeling, SiC Bulk Growth
Abstract

In this work the problem of growth rate decaying during growth is considered. A new design and growth profiles are suggested in order to reduce deviations of growth parameters during the process of growth.

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