Paper Title:

X-Ray Rocking Curve Characterization of SiC Substrates

Periodical Materials Science Forum (Volumes 600 - 603)
Main Theme Silicon Carbide and Related Materials 2007
Edited by Akira Suzuki, Hajime Okumura, Tsunenobu Kimoto, Takashi Fuyuki, Kenji Fukuda and Shin-ichi Nishizawa
Pages 361-364
DOI 10.4028/www.scientific.net/MSF.600-603.361
Citation Murugesu Yoganathan et al., 2008, Materials Science Forum, 600-603, 361
Online since September, 2008
Authors Murugesu Yoganathan, Ping Wu, Ilya Zwieback
Keywords Dislocation, Lattice Curvature, PVT, Silicon Carbide (SiC), Thermal Stress, X-Ray Rocking Curve
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Abstract

X-ray rocking curve characterization is a relatively fast and nondestructive technique that can be utilized to evaluate the crystal quality of SiC substrates. The contribution of lattice curvature to rocking curve broadening is estimated, and shown to be the major contribution to the measured broadening (FWHM). The feedback on lattice quality is used to optimize our SiC growth process. In the optimized growth runs, the typical variation in rocking curve sample angle Ω across the entire 3” diameter wafer is about 0.2 degrees. Possible mechanisms leading to changes in the lattice curvature are discussed.